Surface Modifications of Micro and Millimeter Size Particles with Plasma Enhanced Chemical Vapor Deposition

Abstract

[evdate 2015-04-16] IAS/School of Engineering joint lecture. Title from opening screen.

Abstract: The speaker and his research group demonstrate the huge potential of Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Enhanced Surface Modification (PESM) in two reactor types. On one hand, they are using a simple tube reactor for short treatment times. On the other hand, they developed circulating fluidized bed systems to treat granular particulates for longer times at low pressure and at ambient pressure. The objectives of the particle processing are versatile ranging from flowability or sievability improvements up to sterilization of granular food particulates like sprout or wheat.

Prof Philipp Rudolf von Rohr received his PhD from the Institute of Process Engineering at ETH Zurich in 1983. He was postdoc at the Massachusetts Institute of Technology. He returned to ETH Zurich in 1985, and had served as a Senior Scientist, Head of the Institute of Process Engineering and Head of Mechanical and Process Engineering. He had been Guest Professor at the University of California at Santa Barbara and the Massachusetts Institute of Technology. He is currently Professor for Process Engineering at ETH Zurich.

Prof Rudolf von Rohr’s research focuses on three main areas, namely the transport processes, the plasma assisted processes and high pressure processes including geothermal applications. His recent major achievements are in the area of geothermal energy with the spallation drilling and in the area of plasma assisted processes for particles. Prof Rudolf von Rohr is a Member of the Swiss Academy of Engineering Sciences.

Duration: 62 min.